Contact: Marie Francis, (202) 249-6514
Act Quickly to Submit Poster Abstracts and Take Advantage of Conference Discounts
WASHINGTON (August 15, 2013) – Deadlines for the 2013 Polyurethanes Technical Conference are fast approaching. Time will soon run out to submit poster abstracts, receive discounted registration for the conference and hotel, and register for the Polyurethane Professional Development Program. Hosted by the Center for the Polyurethanes Industry (CPI) of the American Chemistry Council (ACC), the 2013 Polyurethanes Technical Conference will take place Sept. 23 to 25 at the Sheraton Phoenix Downtown Hotel in Phoenix.
“This year’s conference is shaping up to be one of our best,” said Lee Salamone, senior director of CPI. “We’ve expanded our professional development opportunities, and have lined up an impressive number of technical presentations on the latest key issues and topics from industry leaders. Attendees can also look forward to the numerous networking opportunities available at the conference.”
Details about the conference speakers, sessions and events are available in the newly-released Advance Program.
Poster abstracts for this year’s conference must be received by Thursday, Aug. 22. Showcased over the course of the three-day conference, posters address a variety of issues, including breakthrough technologies in the polyurethane market or chemistry, developing markets such as medical or fiberboard, or advancements in product areas such as rigid foam insulation or coatings. Posters may also highlight environmental and stewardship issues, such as product emissions and end-of-life management.
Conference and Hotel Discounts
Attendees can save $200 with early registration, which is available through Friday, Aug. 30. To register for the conference, visit the CPI website.
Discounted hotel reservations are available until August 30th. To receive the group rate, please reference the Polyurethanes Technical Conference when making your reservation.
Polyurethane Professional Development Program (PDP)
CPI’s unmatched education and training opportunity, the Polyurethane PDP, will begin on Sunday, Sept. 22, one day ahead of the official conference opening, and run through Tuesday, Sept. 24. Participants can choose from eight courses, which are taught by subject-matter experts and run concurrently with the technical conference. These courses range from broad, introductory subjects to advanced, specialized topics.
To participate in the PDP, participants must register for the conference. PDP tuition is a single payment of $150, which includes course materials, whether attending one or more courses. Participants must register for each PDP course of interest to receive the appropriate training materials. Onsite PDP registration is available, though attendees are encouraged to secure their spots early. PDP registration and the complete course schedule are available online.
Featuring 16 technical sessions and more than 70 technical presentations, this year’s Polyurethanes Technical Conference provides leaders and professionals with an opportunity to learn about the latest innovations, technical developments and issues affecting the global polyurethanes industry.
New this year, CPI is introducing a pre-conference workshop titled "Introduction to Environmental, Health and Safety (EHS) Issues Relative to Diisocyanates." Industry experts will discuss the fundamental concepts of EHS regulations, industrial hygiene, toxicology, medical surveillance and exposure controls, giving participants a greater understanding of their safe handling use. This workshop is offered at no additional cost to all registered conference attendees and will be held on Sunday, Sept. 22 from 1 to 5 p.m.
Several sponsorship opportunities, including table top exhibition space, are still available. For more information on the conference, including the conference advance program, or to register, visit the CPI website.
Get the latest updates and conference news on LinkedIn and Twitter. Follow @AmChemEvents and use the hashtag #PUtech to join the conversation.